The global demand for EUV Lithography Systems Market is presumed to reach the market size of nearly USD 17.55 BN by 2028 from USD 3.22 BN in 2021 with a CAGR of 27.5% under the study period 2022 - 2028.
EUV lithography systems are the next generation of lithography systems. They are expected to replace the current 193-nm immersion lithography systems. EUV lithography systems have a shorter wavelength and can produce finer features than 193-nm immersion lithography systems. EUV lithography is expected to be used in semiconductor manufacturing, the fastest-growing industry in the world. The semiconductor industry has been using 193-nm immersion lithography for more than two decades, and it is now reaching its limits. The global EUV lithography systems market is anticipated to grow due to increasing demand for semiconductor devices, increasing demand for high-performance chips, and increasing demand for low-power chips.
The research report covers Porter’s Five Forces Model, Market Attractiveness Analysis, and Value Chain analysis. These tools help to get a clear picture of the industry’s structure and evaluate the competition attractiveness at a global level. Additionally, these tools also give an inclusive assessment of each segment in the global market of euv lithography systems. The growth and trends of euv lithography systems industry provide a holistic approach to this study.
Market Segmentation
This section of the euv lithography systems market report provides detailed data on the segments at country and regional level, thereby assisting the strategist in identifying the target demographics for the respective product or services with the upcoming opportunities.
By Equipment
- Mask
- Light Source
- Mirror
- Others
By End-User
- Integrated Device Manufacturers (IDM)
- Foundry
Regional Analysis
This section covers the regional outlook, which accentuates current and future demand for the EUV Lithography Systems market across North America, Europe, Asia-Pacific, Latin America, and Middle East & Africa. Further, the report focuses on demand, estimation, and forecast for individual application segments across all the prominent regions.
Global EUV Lithography Systems Market Share by Region (Representative Graph)
The research report also covers the comprehensive profiles of the key players in the market and an in-depth view of the competitive landscape worldwide. The major players in the euv lithography systems market include Toshiba, ASML, Nikon (Japan), Canon (Japan), Samsung, SK Hynix, Carl Zeiss, Toppan Printing, NTT – Intel, and TSMC. This section consists of a holistic view of the competitive landscape that includes various strategic developments such as key mergers & acquisitions, future capacities, partnerships, financial overviews, collaborations, new product developments, new product launches, and other developments.
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