The global demand for Atomic Layer Deposition Market is presumed to reach the valuation of nearly USD XX MN by 2026 from USD XX MN in 2019 with a CAGR of XX% under the study period of 2020 - 2026.
Atomic Layer Deposition (ALD) is the chemical vapour deposition method that allows deposition of an ultra-thin film in a precisely controlled way. The method offers layer by layer growth with excellent thickness, uniformity, minimum pinhole and particle levels, and low damage. ALD is a low-temperature process, flexible to use for a wide range of materials and processes. It is a useful process for the fabrication of microelectronics due to its ability to produce accurate thicknesses and uniform surfaces.
Growing electronics industry is driving the growth of the market. Growing penetration of solar cell and high demand for 3D NAND storage is opening new boundaries for the advancement of the market. The high penetration rate of solar cell installation across the world owing to high demand for renewable energy will uplift the demand for ALD in the coming years. 3D NAND storage is being developed with the growing demand, as AI (artificial intelligence) and machine learning is becoming more implanted in manufacturing, medical and other industries, there is more pressure on memory capacity thereby, putting pressure on manufacturers to deliver the increased capacity required for processing and storage. The current process development effort by the top companies globally is mainly focused on delivering new, higher quality & throughput and progressive dielectric materials. Recent research is focused on increasing wafer sizes. However, the slow deposition rate and high-cost requirement compare to conventional CVD is restraining the growth of the market.
The report covers Porter’s Five Forces Model, Market Attractiveness Analysis and Value Chain analysis. These tools help to get a clear picture of the industry’s structure and evaluate the competition attractiveness at a global level.
Additionally, these tools also give inclusive assessment of each application/product segment in the global market of Atomic Layer Deposition.
The entire Atomic Layer Deposition market has been sub-categorized into product, and application. The report provides an analysis of these subsets with respect to the geographical segmentation. This research study will keep marketer informed and helps to identify the target demographics for a product or service.
- Aluminum Oxide
- Plasma Enhanced
- Solar devices
- Medical equipment
This section covers regional segmentation which accentuates on current and future demand for Atomic Layer Deposition market across North America, Europe, Asia-Pacific, Latin America, and Middle East & Africa. Further, the report focuses on demand for individual application segment across all the prominent regions.
Global Atomic Layer Deposition Market Share by Region (Representative Graph)
The research report also covers the comprehensive profiles of the key players in the market and an in-depth view of the competitive landscape worldwide. The major players in the Atomic Layer Deposition market include Tokyo Electron Limited, Denton Vacuum LLC, Kurt J. Lesker Company, Beneq Oy, Veeco Instruments. This section includes a holistic view of the competitive landscape that includes various strategic developments such as key mergers& acquisitions, future capacities, partnerships, financial overviews, collaborations, new product developments, new product launches, and other developments.
This market research report has been produced by gathering information on the basis of primary and secondary research. Secondary research has been done by using various sources which include (but not limited to) Company Websites, Paid Data Sources, Technical Journals, Financial Reports, SEC Filings, and other different industry publications.
If specific information is required which is not currently within the scope of the report, it can be provided as a part of customization.